Tantalum Nitride
| Use attributes for filter ! | |
| Formula | TaN |
|---|---|
| Melting point | 3,090 °C |
| Density | 13. 7 g/cm³ |
| Molar mass | 194. 95 g/mol |
| Crystal structure | Hexagonal, hP6 |
| Other cations | Vanadium nitride |
| Niobium nitride | |
| Date of Reg. | |
| Date of Upd. | |
| ID | 2396593 |
About Tantalum Nitride
Tantalum nitride is a chemical compound, a nitride of Tantalum. There are multiple phases of compounds, stoichimetrically from Ta₂N to Ta₃N₅ including TaN. As a thin film TaN find use as a diffusion barrier and insulating layer between copper interconnects in the back end of line of computer chips.