Atomic Layer Deposition: Principles, Characteristics, And Nanotechnology Applications
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| Google books | books.google.com |
|---|---|
| Originally published | 2013 |
| Authors | Tommi Kaariainen |
| Marja-Leena K??ri?inen | |
| Arthur Sherman | |
| David Cameron | |
| Date of Reg. | |
| Date of Upd. | |
| ID | 2457060 |
About Atomic Layer Deposition: Principles, Characteristics, And Nanotechnology Applications
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. . . .
